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Fluorinated etch gases, C4F6
Tokyo, Japan35.68°N 139.77°E
computed criticality14/100
reading
≈$370m market (2024); Linde · Air Liquide · Resonac
2024Fault line
Fluorinated etch gases, hexafluorobutadiene (C4F6) foremost, etch the high-aspect-ratio features of 3D memory and advanced logic. A niche market dominated by Linde, Air Liquide and Resonac, physically concentrated in East Asia near the fabs. A disruption feeds directly through to etch.
Actors
Linde (Danbury)
Air Liquide (Paris)
Resonac / Showa Denko (Tokyo)
Depends on 1
Fluorspar & hydrofluoric acid, ChinaChemicals & Materials · Critical anchor↗Feeds 2
TSMC, HsinchuSilicon↗SK Hynix, IcheonHBM Memory↗Sources